Display Coating Equipment
Product Introduction
This equipment integrates a range of patented technologies and deposition coating methods. The embedded software controls the cathode trajectory for the deposition of imaging display coatings, encompassing the complete process from substrate cleaning to film deposition (including ultra-thin films) and patterning/etching. We offer both pilot and production lines, and the equipment features MES system interfaces that enable real-time data transmission and automatic recording of coating process data. This capability supports the integration necessary for achieving a smart factory.
Key Features
Multi-Dimensional Target and Ion Source Adjustments: Enhance the uniformity and adhesion of polygonal films.
Seamless Docking Operation: Increases productivity and operational efficiency.
Compatibility with Industrial Robots: Supports automatic loading and unloading for streamlined processes.
Key Specs
Device Model | SP-0909AS | SP-1212ASI | SP-1520ASI | SP-2616ASI |
Vacuum Chamber Size (mm) | 900×900 | 1200×1200 | 1500×2000 | 2600×1600 |
Maximum vacuum | 6.0E-5Pa | |||
Air Extraction Time | Ambient Pressure to 5.0E10-3Pa in less than 10 mins | |||
Pressure Rise Rate | 1h≤0.5Pa | |||
Vacuum pump Set | Mechanical pump, Roots pump, Molecular pump, Maintaining Pump | |||
Heating System | Room temperature to 300 ℃ (PID controlled) | |||
Air Injection System | Mass flow controller (1-8 set) | |||
Targets | Arc Target, Sputtering Target, Radio Frequency Target, lon Source | |||
Power Supply | HiPIMS Power Supply, MF Sputtering Power Supply, Arc Power Supply, DC Sputtering Power Supply, Radio Frequency Power Supply, lon source Power supply, etc. | |||
Workpiece Rotation Method | Revolution+rotation, linear variable frequency infinite speed regulation | |||
Operating Method | Manual+Semi-Automatic+Fully Automatic+PLC+IPC | |||
Note | Specifications can be fully customized according to customer's product and recipe requirements | |||
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