Research and Development
The Celli Edge
Celli’s modular PVD systems empower R&D centers with highly versatile thin-film deposition capabilities by combining high scalability, compatibility, and precise control over nanometer-scale architectures and plasma parameters to support rapid material prototyping. This highly adaptable equipment allows for deep customization tailored to specific research directions, capable of sputtering thin films of metals, non-metals, oxides, and dielectrics onto diverse substrates such as ceramics, glass, quartz, and silicon wafers. Ultimately, these advanced systems facilitate rigorous experimentation in materials science, ensuring scalable, repeatable results that seamlessly transition breakthroughs from laboratory discovery to industrial-scale production.
